Product Name: Semiconductor Porous Silicon Carbide Ceramic Sucker
Product Material: Porous Silicon Carbide Ceramic
Material Characteristics:
Adjustable porosity, High temperature resistance, Excellent thermal shock resistance, Good mechanical strength, Outstanding corrosion resistance
Application Fields:
Semiconductor wafer handling, Vacuum chuck systems, High-temperature processing, Precision manufacturing
Application Industries:
Semiconductor manufacturing, Electronic components production, Precision instrumentation, Solar cell production
Processing Difficulties:
Precise porosity control, Uniform pore distribution, Maintaining dimensional stability, Achieving surface flatness, Preventing micro-cracks
Processing Flow:
Powder preparation → Additive mixing → Forming → Sintering → Precision machining → Surface treatment → Quality inspection → Cleaning and packaging
Delivery Period:
30-45 days
The Semiconductor Porous Silicon Carbide Ceramic Sucker is a specialized component designed for semiconductor manufacturing processes. With precisely controlled porosity and exceptional thermal properties, this ceramic sucker provides reliable performance in wafer handling and vacuum chuck applications, ensuring precise operation in demanding semiconductor environments.
Key Features:
Controlled Porosity Structure：Adjustable porosity range (30-50%) with uniform pore distribution
Excellent Thermal Management：Withstands temperatures up to 1600°C with low thermal expansion
High Mechanical Durability：Maintains structural integrity under repeated thermal cycling
Superior Chemical Resistance：Resists acids, alkalis and corrosive gases in semiconductor processes
Precision Manufacturing Quality：Consistent surface flatness and dimensional accuracy for reliable vacuum sealing
Core Technical Specifications
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