Product Name: Wafer Adsorption Silicon Carbide Ceramic Sucker
Product Material: High-Purity Silicon Carbide Ceramic (SiC)
Material Characteristics:
High thermal stability, Excellent wear resistance, Superior chemical inertness, High mechanical strength, Low outgassing
Application Fields:
Semiconductor wafer handling, Vacuum adsorption systems, Precision manufacturing equipment
Application Industries:
Semiconductor fabrication, LED manufacturing, Solar cell production, Microelectronics assembly
Processing Difficulties:
Precise micro-hole drilling, Surface flatness control, Vacuum seal integrity, Thin-wall structure machining, Thermal stress management
Processing Flow:
Powder preparation → Forming → Sintering → CNC machining → Surface polishing → Quality inspection → Cleaning → Packaging
Delivery Period:
30-40 days
The Wafer Adsorption Silicon Carbide Ceramic Sucker is engineered for high-precision wafer handling in semiconductor manufacturing. Utilizing silicon carbide's exceptional properties, it ensures secure vacuum adsorption and reliable performance in cleanroom environments while maintaining wafer integrity throughout production processes.
Key Features:
High Thermal Stability - Maintains dimensional accuracy and adsorption performance at temperatures up to 1600°C
Precision Surface Quality - Ultra-smooth surface finish ensures perfect wafer contact and vacuum seal integrity
Excellent Chemical Resistance - Withstands corrosive chemicals and plasma environments in semiconductor processes
Superior Mechanical Strength - High hardness and wear resistance provide long service life under repeated use
Optimized Vacuum Performance - Precision-engineered micro-structure ensures reliable wafer adsorption and quick release
Core Technical Specifications
Our Market Advantages
